KONG Ling-de, FANG Hui, WEI Hong, LIU Li, ZHOU Ruan-sheng, TIE Xiao-ying, YANG Wen-yun, JI Rong-bin. The Photoelectrical Properties of VOxFilm by As-deposited SiOxDielectric Layer[J]. Infrared Technology , 2015, (4): 319-322.
|
Citation:
|
KONG Ling-de, FANG Hui, WEI Hong, LIU Li, ZHOU Ruan-sheng, TIE Xiao-ying, YANG Wen-yun, JI Rong-bin. The Photoelectrical Properties of VOxFilm by As-deposited SiOxDielectric Layer[J]. Infrared Technology , 2015, (4): 319-322.
|
KONG Ling-de, FANG Hui, WEI Hong, LIU Li, ZHOU Ruan-sheng, TIE Xiao-ying, YANG Wen-yun, JI Rong-bin. The Photoelectrical Properties of VOxFilm by As-deposited SiOxDielectric Layer[J]. Infrared Technology , 2015, (4): 319-322.
|
Citation:
|
KONG Ling-de, FANG Hui, WEI Hong, LIU Li, ZHOU Ruan-sheng, TIE Xiao-ying, YANG Wen-yun, JI Rong-bin. The Photoelectrical Properties of VOxFilm by As-deposited SiOxDielectric Layer[J]. Infrared Technology , 2015, (4): 319-322.
|
DownLoad: