The Analysis of High Purity Tellurium and Cadmium Using Glow Discharge Mass Spectrometry and Ablation Inductively Coupled Plasma Mass Spectrometry

RONG Bai-lian; HU Zan-dong; CONG Shu-ren; HAN Fu-zhong; JI Rong-bin

doi:10.3969/j.issn.1001-8891.2010.04.010

RONG Bai-lian, HU Zan-dong, CONG Shu-ren, HAN Fu-zhong, JI Rong-bin. The Analysis of High Purity Tellurium and Cadmium Using Glow Discharge Mass Spectrometry and Ablation Inductively Coupled Plasma Mass Spectrometry[J]. Infrared Technology , 2010, 32(4): 226-230. DOI: 10.3969/j.issn.1001-8891.2010.04.010

Citation:

RONG Bai-lian, HU Zan-dong, CONG Shu-ren, HAN Fu-zhong, JI Rong-bin. The Analysis of High Purity Tellurium and Cadmium Using Glow Discharge Mass Spectrometry and Ablation Inductively Coupled Plasma Mass Spectrometry[J]. Infrared Technology , 2010, 32(4): 226-230. DOI: 10.3969/j.issn.1001-8891.2010.04.010

Citation:

RONG Bai-lian, HU Zan-dong, CONG Shu-ren, HAN Fu-zhong, JI Rong-bin. The Analysis of High Purity Tellurium and Cadmium Using Glow Discharge Mass Spectrometry and Ablation Inductively Coupled Plasma Mass Spectrometry[J]. Infrared Technology , 2010, 32(4): 226-230. DOI: 10.3969/j.issn.1001-8891.2010.04.010

The Analysis of High Purity Tellurium and Cadmium Using Glow Discharge Mass Spectrometry and Ablation Inductively Coupled Plasma Mass Spectrometry

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The Analysis of High Purity Tellurium and Cadmium Using Glow Discharge Mass Spectrometry and Ablation Inductively Coupled Plasma Mass Spectrometry

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